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Thin Films and Heterostructures for Oxide Electronics »

Book cover image of Thin Films and Heterostructures for Oxide Electronics by Satishchandra B. Ogale

Authors: Satishchandra B. Ogale
ISBN-13: 9780387258027, ISBN-10: 0387258027
Format: Hardcover
Publisher: Springer-Verlag New York, LLC
Date Published: December 2009
Edition: (Non-applicable)

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Author Biography: Satishchandra B. Ogale

Book Synopsis

Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.

Table of Contents

Ch. 1Nanoscale phenomena in ferroelectric thin films3
Ch. 2High-K candidates for use as the gate dielectric in silicon MOSFETs31
Ch. 3Science and technology of high-dielectric constant (k) thin films for next generation CMOS79
Ch. 4Materials requirements for magnetic random-access memory (MRAM) devices129
Ch. 5Maganites, magnetite, and double-perovskite thin films and heterostructures153
Ch. 6Diluted magnetic oxide systems195
Ch. 7Epitaxial growth and properties of magnetically doped TiO[subscript 2]219
Ch. 8Interfaces in materials with correlated electron systems251
Ch. 9Electronic reconstruction at surfaces and interfaces of correlated electron materials279
Ch. 10Wide band gap ZnO and ZnMgO heterostructures for future optoelectronic devices301
Ch. 11Combinatorial synthesis of functional metal oxide thin films333
Ch. 12Real-time growth monitoring by high-pressure RHEED during pulsed laser deposition355
Ch. 13Recent advances in the deposition of multi-component oxide films by pulsed energy deposition385

Subjects